The Development of SemiconductorResearchCenter, NationalChiaoTungUniversity
First-Generation Semiconductor (Transistor) Period
The First Semiconductor Laboratory in Taiwan (1964)
Interior of First-Generation Semiconductor Laboratory (1964)
The First Successful Developers of Bipolar Transistors In Taiwan (1965)
Prospectus of the Fisrt Transistor Laboratory Factory in Taiwan (1965)
First-Generation Semiconductor (Small-scale Integrated Circuit) Period
A First-Generation Mask Manufacturing System
Semiconductor Research Center Workers in 1970s
First-Generation Epitaxy Instruments
Red Cellophane Drawing Instruments
Second-Generation Semiconductor (Large-scale Integrated Circuit) Period
The Second-Generation Semiconductor Research Center Building (1977)
Introductory Pamphlet of NationalScienceCouncilSemiconductorEquipmentCenter
A Second-Generation Furnace System Consisting of Oxidation, Low Pressure Chemical Vapor Deposition (LPVCD), and Annealing
A Reactive Ion Etching (RIE) System
Third-Generation Semiconductor (Super Large-scale Integrated Circuit) Period
The Solid-State ElectronicsBuilding
The NationalNanoDeviceLaboratoryMonument (1992)
A Third-Generation Vacutec Reactive Ion Etching System
Molecular Beam Epitaxy Equipment
NCTU’s Contributions to Semiconductor Industry in Taiwan
In the recent years, the semiconductor industry has been one of the main cornerstones of economic development in Taiwan, and the Semiconductor Research Center (SRC) in NCTU is just the cradle of breeding semiconductor talents.
In 1977, the Ministry of Education subsumed the SRC, whose building was on the NCTU Po-Ai Campus. Since then, the center began to carry out national large-scale electronics research projects and support colleges in Taiwan in doing related semiconductor research works. In 1998, the SRC started the works of developing domestically-designed equipments, and helping manufacturers develop new materials and procedures, including high-density plasma chemical vapor deposition and high-density plasma reactive ion etching. In 1999, the SRC began its reconstruction, set up the basic procedures for producing planar monitors and photoelectric components, and strengthened the services for the researchers. The SRC will work harder in the future to promote academic research and technology development in the related fields of semiconductors and nano technologies.
NCTU’s Firsts (Semiconductor Field)
1958 Established graduate-level “Institute of Electronics”, which was the first place for educating advanced talents of the field.
1963 Established the first “Transistor Laboratory” in Taiwan.
1964 Fabricated the first “point contact transistor” in Taiwan.
1964 Set up the first “Semiconductor Laboratory” in a research factory.
1965 Chun-Yen Chang and Shuang-Fa Guo produced the first batch of “planar bipolar-junction transistors” in Taiwan under Prof. Ruei-Fu Chang’s instruction.
1965 Proposed a prospectus of the first transistor experimental factory in Taiwan.
1966 Chun-Yen Chang and Shuang-Fa Guo fabricated the first “metal-oxide-semiconductor transistor” and “integrated circuit” under Prof. Huang-Chang Ling’s instruction.
1995 NCTU professors’ papers in the periodicals of IEEEED and EDL started to grow, yielding unusually brilliant results in the fields.
The Process for Glass Mask Making
1. Design mask patterns on a graph paper
2. Drawing table for red plastic film
3. Rubylith film
4. Mask fabrication system
5. Working mask
6. Photo mask