Semiconductor Area
 







SRC – Origin of Taiwan’s Semiconductor Development

The research and development of the semiconductor industry in Taiwan began in 1960s. National ChiaoTung University (NCTU) had been soliciting experts in Taiwan and abroad to further the research, development, and education in this field. In 1960, the United Nations Special Foundation approved NCTU’s Institute of Electronics to operate the “Research and TrainingCenter for Telecommunications and Electronics.” Gradually this plan developed into the present Semiconductor Research Center (SRC). With the funds from the Ministry of Education and National Science Council, the joint semiconductor laboratory was built to provide services and help the professors, students, and industries to do prospective research. The scholars’ wholehearted devotion to their works not only advanced the high technology in this field, but also produced well-trained professionals. So far, most of the hard cores in Taiwan semiconductor industry were bred in this center.

The main objective of this center is to educate hi-tech professionals for academic and industrial fields, enhance the level of academic research in electronics, and enlarge the development of the IC industry. In the future, the SRC will cooperate with the National Nano Device Laboratory in the research of submicron. And high-frequency communication components, display components, system chips, next generation micro-optical components, and micro-electro-mechanics will be the priority. Besides, we will constantly breed talents and expand the application fields of semiconductors (P.S.: the SRC has been renamed Nano Facility Center in February 2003).

From The Stone Age to The Silicon Age

In the society of the agriculture period, human beings passed through the Stone Age, the Bronze Age, and the Iron Age. Every breakthrough in production technologies had a strong impact on the social development. Now, the production value of electronic devices made from silicon has surpassed that from steel. And human history is entering a new period, the Silicon Age.

Silicon is the most common material on the earth, and many kinds of stones are composed of silicon dioxide. However, integrated circuits manufactured with the silicon material through hundreds of procedures are worth thousands of dollars. The process of turning stones into silicon chips is indeed a miracle of modern science. Semiconductor devices made by silicon, like memory devices, logic devices, microprocessors, optical devices, and sensors, provide close services everywhere in our life, such as in televisions, telephones, computers, refrigerators, airplanes, cars, satellites, etc.

 











The Development of SemiconductorResearchCenter, NationalChiaoTungUniversity

第一代半導體(電晶體)時期
First-Generation Semiconductor (Transistor) Period

  • 我國第一座半導體實驗室外貌
    The First Semiconductor Laboratory in Taiwan (1964)
  • 第一代半導體電晶體實驗室內部
    Interior of First-Generation Semiconductor Laboratory (1964)
  • 我國成功研製雙極性電晶體的團隊
    The First Successful Developers of Bipolar Transistors In Taiwan (1965)
  • 我國第一座電晶體實驗工場計畫書
    Prospectus of the Fisrt Transistor Laboratory Factory in Taiwan (1965)

第一代半導體(小型積體電路)時期
First-Generation Semiconductor (Small-scale Integrated Circuit) Period

  • 第一代罩幕製作系統
    A First-Generation Mask Manufacturing System
  • 1970年代半導體中心工作同仁合影
    Semiconductor Research Center Workers in 1970s
  • 第一代磊晶設備
    First-Generation Epitaxy Instruments
  • 紅膠紙製圖桌
    Red Cellophane Drawing Instruments

第二代半導體(大型積體電路)時期
Second-Generation Semiconductor (Large-scale Integrated Circuit) Period

  • 第二代半導體中心大樓外貌
    The Second-Generation Semiconductor Research Center Building (1977)
  • 國科會半導體貴重儀器使用中心簡介
    Introductory Pamphlet of NationalScienceCouncilSemiconductorEquipmentCenter
  • 第二代八支石英爐管
    A Second-Generation Furnace System Consisting of Oxidation, Low Pressure Chemical Vapor Deposition (LPVCD), and Annealing
  • 反應性離子蝕刻系統
    A Reactive Ion Etching (RIE) System

第三代半導體(超大型積體電路)時期
Third-Generation Semiconductor (Super Large-scale Integrated Circuit) Period

  • 固態電子系統大樓一隅
    The Solid-State ElectronicsBuilding
  • 「國家毫微米元件實驗室」落成紀念碑
    The NationalNanoDeviceLaboratoryMonument (1992)
  • 介電薄膜活性離子蝕刻系統(第三代)
    A Third-Generation Vacutec Reactive Ion Etching System
  • 分子束磊晶設備
    Molecular Beam Epitaxy Equipment

 

NCTU’s Contributions to Semiconductor Industry in Taiwan

In the recent years, the semiconductor industry has been one of the main cornerstones of economic development in Taiwan, and the Semiconductor Research Center (SRC) in NCTU is just the cradle of breeding semiconductor talents.

In 1977, the Ministry of Education subsumed the SRC, whose building was on the NCTU Po-Ai Campus. Since then, the center began to carry out national large-scale electronics research projects and support colleges in Taiwan in doing related semiconductor research works. In 1998, the SRC started the works of developing domestically-designed equipments, and helping manufacturers develop new materials and procedures, including high-density plasma chemical vapor deposition and high-density plasma reactive ion etching. In 1999, the SRC began its reconstruction, set up the basic procedures for producing planar monitors and photoelectric components, and strengthened the services for the researchers. The SRC will work harder in the future to promote academic research and technology development in the related fields of semiconductors and nano technologies.

 

NCTU’s Firsts (Semiconductor Field)

1958 Established graduate-level “Institute of Electronics”, which was the first place for educating advanced talents of the field.

1963 Established the first “Transistor Laboratory” in Taiwan.

1964 Fabricated the first “point contact transistor” in Taiwan.

1964 Set up the first “Semiconductor Laboratory” in a research factory.

1965 Chun-Yen Chang and Shuang-Fa Guo produced the first batch of “planar bipolar-junction transistors” in Taiwan under Prof. Ruei-Fu Chang’s instruction.

1965 Proposed a prospectus of the first transistor experimental factory in Taiwan.

1966 Chun-Yen Chang and Shuang-Fa Guo fabricated the first “metal-oxide-semiconductor transistor” and “integrated circuit” under Prof. Huang-Chang Ling’s instruction.

1995 NCTU professors’ papers in the periodicals of IEEEED and EDL started to grow, yielding unusually brilliant results in the fields.


The Process for Glass Mask Making

1. Design mask patterns on a graph paper

2. Drawing table for red plastic film

3. Rubylith film

4. Mask fabrication system

5. Working mask

6. Photo mask